{"schema_version":1,"experiment_id":"eoa_inverse_innovation_exp09_archetype_breadth150_20260804","research_id":"eoa_inverse_innovation_exp09_light_prior_art_20260804","cell_id":"layer_decay_and_expiration_management__chemistry_materials","search_lanes":{"direct_problem_and_intervention":{"queries":["semiconductor thin film deposition chamber wall deposits seasoning cleaning particle flaking recipe history maintenance","CVD chamber coating deposit stress flaking particle contamination cleaning interval patent"],"source_ids":["SRC1","SRC2"],"no_result_note":null},"synonyms_and_historical_terms":{"queries":["process chamber seasoning recipe history cleaning endpoint condition based maintenance","semiconductor chamber matching seasoning process kit lifetime predictive maintenance deposits"],"source_ids":["SRC2","SRC3"],"no_result_note":null},"products_practices_and_standards":{"queries":["patent chamber component lifetime accumulated deposition thickness cleaning replacement semiconductor","SEMI standard chamber cleaning deposited residues maintenance safety semiconductor equipment"],"source_ids":["SRC2","SRC3","SRC4"],"no_result_note":null},"component_combination":{"queries":["zone specific chamber deposit thickness recipe history condition based maintenance","PECVD chamber wall deposited film spatial variation maintenance study coupon","thin film reactor wall deposition history multi recipe cross contamination cleaning chamber"],"source_ids":["SRC1","SRC2","SRC3"],"no_result_note":null}},"sources":[{"source_id":"SRC1","title":"Understanding the Chamber Wall-Deposited Thin Film of Plasma Deposition Equipment for the Efficiency of In Situ Dry-Cleaning","publisher":"MDPI AG, Coatings","url":"https://explore.openaire.eu/search/publication?pid=10.3390%2Fcoatings15050563","source_type":"PRIMARY_RESEARCH","claims_supported":["PECVD films accumulate on chamber walls and can cause particle contamination and process drift.","Measured wall deposits differed by chamber height in chemistry, morphology, cleanability, and particle risk, supporting zone-differentiated maintenance observations.","The study used wall-mounted silicon coupons to characterize contamination spatially."]},{"source_id":"SRC2","title":"US7604841B2 — Method for extending time between chamber cleaning processes","publisher":"Tokyo Electron Ltd.; patent record hosted by Google Patents","url":"https://patents.google.com/patent/US7604841B2/en","source_type":"OTHER","claims_supported":["Chamber deposits are commonly removed after particle threats, between incompatible sequential processes, or after poor process results.","Film stress, total thickness, and thermal changes can produce cracking, flaking, and particle contamination.","A particle-reducing layer can be formed over an existing deposit before a new deposit, establishing close physical-layer-stack prior art.","Particle measurements and process monitoring can inform interruption and cleaning decisions."]},{"source_id":"SRC3","title":"US6413321B1 — Method and apparatus for reducing particle contamination on wafer backside during CVD process","publisher":"Applied Materials, Inc.; patent record hosted by Google Patents","url":"https://patents.google.com/patent/US6413321B1/en","source_type":"OTHER","claims_supported":["Periodic chamber cleaning followed by seasoning is an established approach.","A deliberately retained wall coating can reduce contamination, so a freshly cleaned surface is not invariably the preferred process condition.","The chamber is used for a predetermined number of wafers before reseasoning, illustrating count-based lifecycle practice."]},{"source_id":"SRC4","title":"Semiconductors — Device Fabrication","publisher":"U.S. Occupational Safety and Health Administration","url":"https://www.osha.gov/semiconductors/silicon/device-fabrication","source_type":"OFFICIAL_GUIDANCE","claims_supported":["Maintenance personnel working on deposition reaction chambers may be exposed to hazardous reaction-product residues.","Deposition equipment can contain toxic, irritative, or corrosive materials, making approved access and residue-handling controls necessary."]}],"problem_evidence":{"status":"PARTLY_SUPPORTED","finding":"The physical and operational problem is visible: wall films accumulate, vary spatially, change process behavior, can crack or flake, and sometimes provide beneficial seasoning. Prior art also identifies thickness, stress, thermal history, incompatible process transitions, particles, and poor results as maintenance-relevant signals. The retained sources do not establish how commonly plants lack zone-specific provenance or rely only on fixed counts and current alarms.","source_ids":["SRC1","SRC2","SRC3"]},"closest_prior_art":[{"name":"Layered particle-reduction and condition-triggered chamber maintenance","source_ids":["SRC2"],"overlap":"Manages an existing chamber deposit, an added protective layer, and subsequent deposits; recognizes stress, thickness, thermal changes, incompatible process transitions, particle thresholds, and process results as cleaning considerations.","remaining_difference":"It does not disclose an auditable zone-specific chronological passport linking each production recipe to estimated layers, lifecycle states, qualified-recipe dependencies, preservation holds, and removal tombstones."},{"name":"Spatial characterization for optimized chamber cleaning","source_ids":["SRC1"],"overlap":"Characterizes deposits by chamber location and finds location-dependent composition, morphology, cleanability, and particle risk, closely matching the proposal's zone-differentiated observation premise.","remaining_difference":"It characterizes accumulated contamination experimentally but does not manage recipe-by-recipe layer identity, expiration state, dependencies, or disposition evidence."},{"name":"Periodic cleaning followed by beneficial chamber seasoning","source_ids":["SRC3"],"overlap":"Explicitly treats a deposited chamber-wall layer as beneficial after cleaning and uses wafer count plus particle outcomes to manage the chamber condition.","remaining_difference":"It lacks differentiated histories for successive production deposits and the proposed dependency-safe, recoverable disposition workflow."}],"prior_art_disposition":"ADJACENT_PRIOR_ART","contrastive_claim_remaining":"The bounded-search distinction is an auditable, zone-specific chronological deposit-stack record whose advisory disposition jointly evaluates recipe/material identity, effective age or load, incompatible transitions, observed condition, qualified-process dependence, and recoverability evidence. The closest art manages physical multilayers, seasoning, spatial condition, or cleaning triggers, but the retained sources do not combine them into this lifecycle and deletion-control object.","contrastive_claim_falsifier":"The contrast is falsified if an established system or procedure already maintains recipe-associated deposit layers by chamber zone and uses age, compatibility, process dependency, and recoverability states to govern cleaning disposition; empirically, it is also undermined if the passport cannot be reconstructed reproducibly or adds no predictive value over the existing schedule and particle history.","gates":{"adequate_source_search":{"status":"PASS","rationale":"The search covered direct terminology, seasoning and other historical terms, maintenance practices and patents, official safety guidance, spatial deposits, recipe transitions, and component combinations. Exactly four opened sources from four named publishers or authorities were retained, including primary research and official guidance.","source_ids":["SRC1","SRC2","SRC3","SRC4"]},"supported_problem":{"status":"PASS","rationale":"Primary research and patent literature support accumulated and spatially heterogeneous wall films, process drift, stress-driven flaking, incompatibility-related cleaning, and beneficial seasoning. Only the claimed prevalence of missing lifecycle records remains unsupported.","source_ids":["SRC1","SRC2","SRC3"]},"distinct_testable_claim":{"status":"PASS","rationale":"The remaining passport claim specifies identifiable data fields and decision factors that can be compared with the closest physical-layer, seasoning, and spatial-characterization art and tested against an existing maintenance baseline.","source_ids":["SRC1","SRC2","SRC3"]},"bounded_next_test":{"status":"PASS","rationale":"Reconstructing 20 lots for two zones, scoring in shadow mode, and comparing predeclared classifications with approved observations at one scheduled opening is bounded and can measure missingness, inter-rater agreement, false alerts, misses, and incremental association without changing maintenance timing.","source_ids":["SRC1","SRC2","SRC3"]},"no_obvious_safety_or_authority_stop":{"status":"PASS","rationale":"A records-based advisory pilot and approved non-destructive observations present no obvious stop when performed during authorized maintenance. Chamber access, sampling, retained residues, cleaning changes, and operational commands must remain excluded unless separately approved because deposition-chamber residues can expose maintenance personnel to hazardous chemicals.","source_ids":["SRC4"]}},"screen_survival":true,"world_novelty_boundary":"This bounded public-web screen found adjacent multilayer, seasoning, spatial-characterization, and condition-triggered cleaning art but no retained source containing the complete passport workflow. It cannot establish world novelty, patentability, freedom to operate, market size, expert acceptance, practice prevalence, or realized value."}