{"schema_version":1,"experiment_id":"eoa_inverse_innovation_exp09_archetype_breadth150_20260804","research_id":"eoa_inverse_innovation_exp09_light_prior_art_20260804","cell_id":"load_leveling_or_demand_smoothing__chemistry_materials","search_lanes":{"direct_problem_and_intervention":{"queries":["DLP 3D printing segmented exposure mask tiles sequential exposure thermal shrinkage photopolymer","vat photopolymerization area projection sequential segmented exposure reduce stress heat","DLP photopolymerization exotherm temperature full layer exposure shrinkage stress"],"source_ids":["SRC1","SRC3"],"no_result_note":null},"synonyms_and_historical_terms":{"queries":["controlled segmental curing photopolymer stress sequential segments","mask image planning deformation control projection stereolithography","pulse-delay photocuring polymerization stress thermal shrinkage"],"source_ids":["SRC1","SRC2","SRC3"],"no_result_note":null},"products_practices_and_standards":{"queries":["patent DLP layer partition regions sequential exposure photopolymerization temperature control","patent additive manufacturing segmented mask sequential cure tiles DLP exposure order","official vat photopolymerization resin safety ventilation UV radiation guidance"],"source_ids":["SRC2","SRC4"],"no_result_note":null},"component_combination":{"queries":["photocure layer segments sequentially shrinkage stress mask","photopolymerization spatiotemporal exposure sequence thermal feedback infrared","vat photopolymerization scan strategy reduce residual stress sequential exposure islands"],"source_ids":["SRC1","SRC2","SRC3"],"no_result_note":"No retained source combined closed-loop thermal-headroom release, nonadjacent DLP cohorts, complete-dose accounting, maximum tile delay, protected early regions, and rotating cohort order."}},"sources":[{"source_id":"SRC1","title":"Mask Image Planning for Deformation Control in Projection-Based Stereolithography Process","publisher":"American Society of Mechanical Engineers, Journal of Manufacturing Science and Engineering","url":"https://openurl.ebsco.com/contentitem/doi%3A10.1115/1.4029802?id=ebsco%3Adoi%3A10.1115%2F1.4029802&sid=ebsco%3Aplink%3Acrawler","source_type":"PRIMARY_RESEARCH","claims_supported":["Mask-image projection stereolithography is an area-exposure process whose acrylate-resin shrinkage creates deformation-control challenges.","Planned alternative mask-image exposure strategies were experimentally tested on a commercial MIP-SL machine and reduced deformation by as much as 32%."]},{"source_id":"SRC2","title":"US6783810B2: Reducing polymerization stress by controlled segmental curing","publisher":"United States Patent and Trademark Office, accessed through Google Patents","url":"https://patents.google.com/patent/US6783810B2/en","source_type":"OTHER","claims_supported":["Older controlled-segmental-curing art exposes selected photopolymer segments while limiting exposure of substantially adjacent segments.","The disclosure includes preselected segment exposure sequences, selectively controlled light sources, substantially complete cure, and polymerization-stress reduction through relaxation in less-cured neighboring material."]},{"source_id":"SRC3","title":"Analysis of UV Curing Strategy on Reaction Heat Control and Part Accuracy for Additive Manufacturing","publisher":"MDPI Polymers; repository copy from Friedrich-Alexander-Universität Erlangen-Nürnberg","url":"https://open.fau.de/items/bfd96793-18aa-4fcd-9cf4-e0799f54d2b9/full","source_type":"PRIMARY_RESEARCH","claims_supported":["IR monitoring showed that one-time UV exposure produced a higher reaction-temperature peak than fragmented exposure with the same energy input.","Exposure frequency could adjust peak temperature, and reduced temperature was associated with sharply reduced warpage, although shrinkage did not improve uniformly."]},{"source_id":"SRC4","title":"Safe Desktop Vat Photopolymerization 3-D Printing","publisher":"CDC National Institute for Occupational Safety and Health","url":"https://www.cdc.gov/niosh/media/pdfs/2025/01/Safe-3D-Printing.pdf","source_type":"OFFICIAL_GUIDANCE","claims_supported":["Uncured resin can cause dermatitis or asthma, and printing or UV/heat curing can release particles and gases.","NIOSH recommends ventilation, suitable gloves and other PPE, UV eye protection, clean handling, and controlled spill and waste procedures."]}],"problem_evidence":{"status":"PARTLY_SUPPORTED","finding":"The general mechanism is visible: projection photopolymerization has documented shrinkage-related deformation, one-time UV curing can create a higher reaction-temperature peak than dose-equivalent fragmented curing, and exposure planning can reduce deformation. The retained evidence does not directly demonstrate that a large, dense DLP layer exceeds a quantified vat heat-removal or stress-relaxation capacity while its longer-window load remains manageable.","source_ids":["SRC1","SRC2","SRC3"]},"closest_prior_art":[{"name":"Mask-image planning for deformation control in projection stereolithography","source_ids":["SRC1"],"overlap":"Changes the exposure masks used to build projection-stereolithography layers and experimentally reduces shrinkage-related deformation.","remaining_difference":"The retained account does not disclose IR-based thermal-headroom gating, explicit nonadjacent cohort release, a per-tile dose/deadline ledger, protected early regions, or rotating service order."},{"name":"Controlled segmental curing","source_ids":["SRC2"],"overlap":"Spatially separates adjacent photocure events, permits preselected sequential segment exposure, seeks complete cure, and reduces polymerization stress by allowing neighboring material to relax.","remaining_difference":"It is exemplified for dental restoration rather than large-area DLP layers and lacks measured thermal-capacity feedback, layer-cycle completion constraints, and fairness or anchor policies."},{"name":"Dose-preserving fragmented UV exposure","source_ids":["SRC3"],"overlap":"Distributes a fixed total UV exposure over time, uses IR measurement, lowers the maximum reaction temperature, and evaluates shrinkage and warpage.","remaining_difference":"It fragments exposure globally on a fixed schedule rather than adaptively releasing nonadjacent spatial cohorts from a thermal-headroom signal, and it has no tile-service ledger."}],"prior_art_disposition":"SUBSTANTIAL_COLLISION","contrastive_claim_remaining":"In large-area DLP, a closed-loop controller can use measured thermal headroom to release nonadjacent spatial mask cohorts while guaranteeing every tile's full dose and maximum completion delay, protecting validated early regions and rotating ordinary order, and thereby reduce intra-layer temperature or contraction peaks without seams, secondary peaks, conversion loss, adhesion loss, or extra cycle time beyond the fixed bound compared with both full-mask exposure and fixed mask-planning schedules.","contrastive_claim_falsifier":"The claim is falsified if earlier art is found that already couples DLP spatial cohorts to in-situ thermal-capacity feedback with explicit complete-dose and maximum-delay accounting, or if the proposed matched-dose coupon comparison shows no peak reduction, peak migration, missed tile service, or worse conversion uniformity, warpage, seams, or interlayer adhesion.","gates":{"adequate_source_search":{"status":"PASS","rationale":"The bounded search covered direct terminology, historical segmental and pulse-delay terminology, projection-mask practices, patents and safety guidance, and component combinations. Exactly four opened sources from four publisher or institutional channels were retained, including primary research and official guidance.","source_ids":["SRC1","SRC2","SRC3","SRC4"]},"supported_problem":{"status":"PASS","rationale":"The problem passes at coarse-screen level because projection-resin shrinkage deformation and concentrated reaction-temperature loading are documented, although the exact large-area capacity-threshold formulation remains only partly supported.","source_ids":["SRC1","SRC2","SRC3"]},"distinct_testable_claim":{"status":"PASS","rationale":"Despite substantial collision on segmentation and temporal smoothing, the integrated closed-loop thermal-headroom policy with dose/deadline accounting, protected regions, and rotating order remains a distinct, measurable contrast.","source_ids":["SRC1","SRC2","SRC3"]},"bounded_next_test":{"status":"PASS","rationale":"A paired coupon experiment using one approved resin and geometry can compare full-mask, fixed planned-mask, and four-cohort feedback schedules at matched tile dose and maximum layer time while measuring IR temperature, completion, conversion, warpage, and adhesion with explicit rejection criteria.","source_ids":["SRC1","SRC3"]},"no_obvious_safety_or_authority_stop":{"status":"PASS","rationale":"The proposed first step is non-production coupon work within an approved enclosure, resin, exposure range, ventilation, interlocks, and thermal limits. Known resin, airborne-emission, and UV hazards require the stated laboratory controls but do not create an obvious stop.","source_ids":["SRC4"]}},"screen_survival":false,"world_novelty_boundary":"This light screen found substantial prior-art collision on spatial segment curing, projection-mask planning, and dose-preserving temporal fragmentation. It did not locate the complete feedback-gated and service-accounted combination, but bounded public-web search cannot establish world novelty, patentability, freedom to operate, market size, expert acceptance, or realized value."}